Thin-Film Deposition: Principles and Practice

Book Description

Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.

Customer Reviews:

Good book for a beginner in thin film deposition.......2004-03-26

I recommend this book to anyone who is interested in process technologies that are used in chipmaking. The chapters are organized well and points are explained in a clear concise way. I am a chemistry major and this book helped me get started in my first job in a chipmaking company.

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CVD Principles and Reactor Technologies - All in One!

Principles of Chemical Vapor Deposition
D.M. Dobkin , and M.K. Zuraw
Manufacturer: Springer
ProductGroup: Book
Binding: Hardcover

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Similar Items:

Handbook of Chemical Vapor Deposition: Principles, Technologies and Applications (Cvd : Principles, Technology, and Applications)
Chemically Reacting Flow : Theory and Practice

Accessories:

Mathematical Models in Population Biology and Epidemiology
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ASIN: 1402012489

Book Description

Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes, then Principles of Chemical Vapor Deposition is for you!

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment.

This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

This book will be invaluable to process engineers, graduate students and researchers newly involved in the development of processes and hardware for chemical vapor deposition. In addition, the book is appropriate for senior level undergraduates or graduate courses on chemical vapor deposition as well as semiconductor manufacturing and coating technologies.

Customer Reviews:

CVD Principles and Reactor Technologies - All in One!.......2004-06-23

The book is a wonderful treatise on the topic of Chemical Vapor Deposition. It provides not only a sound understanding of the state-of-the art technology involved in CVD for contemporary microelectronic applications, but also enunciates the basic principles and fundamental physical laws which are necessary for a detailed understanding of the subject. I found the informal pedagogy scheme followed by the authors as an useful approach, making the complex topic interesting, while at the same time the text equips the reader with the terminology which constitutes the technical parlance on the subject. For example, the authors have (thankfully) clarified and clearly defined various terms (to mention a few) like `sccm', `diffusion length', `step coverage', `reactive sticking coefficient', `gap filling', and the various dimensionless numbers including Reynold's number, Peclet number and Knudsen number- all of which are of routine utility for the practicing technologist, but unfortunately are often not addressed in a single text on the subject.

The book addresses the various reactor technologies involved in CVD, along with the system configurations. While on the one hand, it introduces the reader to the various essential system modules and their functions in the CVD process, on the other hand, it outlines the basic physical and-chemical laws which define the different elements of the CVD reactor. The chemistry, kinetics and reaction mechanisms of silicon-dioxide and silicon-nitride deposition are covered in much detail, giving valuable insight into these two applications. Various other CVD films of importance to microelectronics are covered as well. The coverage is comprehensive, and the wide range of topics that the authors have beautifully brought together makes it an optimal introduction to the understanding of physical laws, and their application in CVD technology.

Book Description

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. This second edition is an update with a considerably expanded and revised scope.

Plasma CVD and metallic-organic CVD (MOCVD) are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

The new edition also chronicles the recent expansion of a number of materials produced by CVD, including copper, tungsten, diamond, silicon carbide and silicon nitride, titanium nitride, and others.

Key Features:

- Practical approach in the handbook stresses CVD use in industry, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters, and man others

- Coverage of the chemistry and deposition techniques of new materials produced by CVD as been greatly expanded in the book

- Special focus on the rapid growth of two major CVD processes: plasma CVD and metallo-organic CVD

- Emphasizes the broad expansion of the use of CVD processes in today’s industry, showing the reasons for the growth and the different appli-cations that have developed in the last few years

Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology)

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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology)
Arthur Sherman
Manufacturer: Noyes Publications
ProductGroup: Book
Binding: Hardcover

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ASIN: 0815511361

Book Description

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Book Description

All papers were peer-reviewed. This proceedings volume contains the invited talks presented at two atomic physics symposia held jointly in Buenos Aires, Argentina from 28-30 July 2005. They represent the latest research in dynamics of collision systems involving collisions between photons, electrons, and ions and a diverse range of target species: atoms, molecules, clusters, and surfaces. There is a particular emphasis on correlation and many-body effects in excitation and ionization.

Optical Polarization of Molecules (Cambridge Monographs on Atomic, Molecular and Chemical Physics)

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Optical Polarization of Molecules (Cambridge Monographs on Atomic, Molecular and Chemical Physics)
Marcis Auzinsh , and Ruvin Ferber
Manufacturer: Cambridge University Press
ProductGroup: Book
Binding: Hardcover

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Book Description

This book explains the theory and methods by which gas molecules can be polarized by light, a subject of considerable importance for what it tells us about the electronic structure of molecules and properties of chemical reactions. Starting with a brief review of molecular angular momentum, the text goes on to consider resonant absorption, fluorescence, photodissociation and photoionization, as well as collisions and static fields. A variety of macroscopic effects are considered, among them angular distribution and the polarization of emitted light, ground state depopulation, laser-induced dichroism, the effect of collisions and external magnetic and electric field effects. Most examples in the book are for diatomic molecules, but symmetric-top polyatomic molecules are also included. The book concludes with a short appendix of essential formulae, tables for vector calculus, spherical functions, Wigner rotation matrices, Clebsch-Gordan coefficients, and methods for expansion over irreducible tensors.

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Optical Polarization of Molecules
Marcis/ Ferber, Ruvin Auzinsh
Manufacturer: Cambridge Univ Pr 01/1//1995
ProductGroup: Book
Binding: Paperback
ASIN: B000N5MHNK

Book Description

Resonating with ancient themes of quest and transformation, The Last Paradise follows Travis Doyle, a Vietnam veteran working as an insurance claims adjuster, from California to Hawaii. Doyle is dispatched to investigate fire damage to outbuildings, equipment, and vehicles at a geothermal drilling site located in volcanic lava fields believed by the local inhabitants to be the home of Pele, the fire goddess.

Customer Reviews:

Paradigm Regained.......2001-12-29

Before Michener, Hawai'i was an open-season setting for every visitor who made an occupation of putting pen to paper. Since the local literary renaissance, built in part on the objections of people who live in Hawai'i to Michener's failure to "get it right," few outsiders have stood up to challenge the likes of Darrell Lum, Lois-Ann Yamanaka, and -- most recently -- Chris McKinney. The Last Paradise is less a challenge to those talented local writers than a contribution to the widening pool of literature that celebrates an authentic Island experience without unduly demonizing or romanticizing. But romantic it is, in both the narrow, amorous sense and in the sense that inspires wonder at the natural and spritual forces that pervade human life, whether we pay homage to them or not. Jim Houston is not a Hawai'i-based writer, but he has spent considerable time here and his acculturation seems as complete as an outsider's can be. The writing is lyrically beautiful and authentic-feeling, and the characters Travis Doyle and Evangeline "Angel" Sakai are three-dimensional and vital as their mingling fluids. This is a good read, whether you grew up in Hawai'i like Angel or on the West Coast like Travis; it's a good read for anybody who likes to ponder things that count, such as how long this earth will continue to sustain human beings regardless of what we make of it or ourselves.

Looks formulaic at first, but blossoms into a fine novel........1998-11-24

A restless VietNam vet PI, a beautiful mixed-blood Hawaiian woman, slimeball corporations, spiritual but passive islanders, the Goddess Pele: this is potentially as dangerous ground as a fresh lava flow. Fortunately, Houston is a sufficiently subtle author to create credible and sympathetic characters, provide suspense and surprise, and keep the reader totally engaged. Not as strong as Kiana Davenport's magnicent Shark Dialogues, but a very entertaning page turner with a good environmental message.

America's Love Affair With Life Insurance

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America's Love Affair With Life Insurance
Roy C. Windsor
Manufacturer: Authorhouse
ProductGroup: Book
Binding: Paperback

Beneficiary Basics: What You Don't Know Now May Hurt Someone You Love Later

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Beneficiary Basics: What You Don't Know Now May Hurt Someone You Love Later
Joseph M. Chopp
Manufacturer: Authorhouse
ProductGroup: Book
Binding: Hardcover

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Love Insurance
Earl Derr Biggers
Manufacturer: Wildside Press
ProductGroup: Book
Binding: Hardcover

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ASIN: 1592241840

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Love Insurance
Earl Derr Biggers
Manufacturer: Grosset & Dunlap
ProductGroup: Book
Binding: Hardcover
ASIN: B000NWPJQA

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The Power of Love
Michel Baroin
Manufacturer: Pergamon
ProductGroup: Book
Binding: Hardcover

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ASIN: 0080365620

Sounds from afar: Leibold loves the challenge of Scottish music.(Music Maker)(Chuck Leibold ) : An article from: Business Record (Des Moines)

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Sounds from afar: Leibold loves the challenge of Scottish music.(Music Maker)(Chuck Leibold ) : An article from: Business Record (Des Moines)
Sharon Baltes
Manufacturer: Business Publication Corp.
ProductGroup: Book
Binding: Digital

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Agents Love E-Mail, IVANS Study Shows.: An article from: National Underwriter Property & Casualty-Risk & Benefits Management

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Agents Love E-Mail, IVANS Study Shows.: An article from: National Underwriter Property & Casualty-Risk & Benefits Management
Lee Ann Gjertsen
Manufacturer: The National Underwriter Company
ProductGroup: Book
Binding: Digital

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Book Description

This digital document is an article from National Underwriter Property & Casualty-Risk & Benefits Management, published by The National Underwriter Company on July 27, 1998. The length of the article is 940 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.

Citation Details
Title: Agents Love E-Mail, IVANS Study Shows.
Author: Lee Ann Gjertsen
Publication: National Underwriter Property & Casualty-Risk & Benefits Management (Magazine/Journal)
Date: July 27, 1998
Publisher: The National Underwriter Company
Volume: v102 Issue: n30 Page: p19(1)

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AII's fair in love, war, and D&O markets. (D&O Developments).(directors and officers' insurance market forecast)(Brief Article): An article from: National ... & Casualty-Risk & Benefits Management

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AII's fair in love, war, and D&O markets. (D&O Developments).(directors and officers' insurance market forecast)(Brief Article): An article from: National ... & Casualty-Risk & Benefits Management
Susanne Sclafane
Manufacturer: The National Underwriter Company
ProductGroup: Book
Binding: Digital

General | Business & Investing | Subjects | Books

Book Description

This digital document is an article from National Underwriter Property & Casualty-Risk & Benefits Management, published by The National Underwriter Company on April 15, 2002. The length of the article is 1755 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.

Citation Details
Title: AII's fair in love, war, and D&O markets. (D&O Developments).(directors and officers' insurance market forecast)(Brief Article)
Author: Susanne Sclafane
Publication: National Underwriter Property & Casualty-Risk & Benefits Management (Magazine/Journal)
Date: April 15, 2002
Publisher: The National Underwriter Company
Volume: 106 Issue: 15 Page: 20(2)

Article Type: Brief Article

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Buffer stock saving in retirement accounts [An article from: Journal of Monetary Economics]

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Buffer stock saving in retirement accounts [An article from: Journal of Monetary Economics]
D. Love
Manufacturer: Elsevier
ProductGroup: Book
Binding: Digital

Elsevier | By Publisher | e-Docs | Formats | Books
ASIN: B000PAUM2Q

Book Description

This digital document is a journal article from Journal of Monetary Economics, published by Elsevier in 2006. The article is delivered in HTML format and is available in your Amazon.com Media Library immediately after purchase. You can view it with any web browser.

Description:
We use a dynamic programming model to explore the possibility and extent of precautionary saving in tax-sheltered accounts such as the 401(k). The main policy experiment examines the behavior of saving for different levels of unemployment insurance (UI), which is a perfect substitute for precautionary saving against job loss. Our results indicate that increasing the generosity of UI crowds out 401(k) contributions made by younger workers, who save primarily for precautionary reasons. At the aggregate level, we find that 401(k)s increase national saving and that the magnitude of the effect depends on the generosity of UI.

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